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Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

by Y. Pauleau

  • ISBN: 9781402005251
  • ISBN10: 1402005253

Chemical Physics of Thin Film Deposition Processes for Micro- and Nano-Technologies

by Y. Pauleau

  • List Price: $159.00
  • Binding: Paperback
  • Publisher: Kluwer Academic Pub
  • Publish date: 04/01/2002
  • ISBN: 9781402005251
  • ISBN10: 1402005253
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Description: Electroplating and Electroless Deposition Processes for Electronic Components and Microsystems.- Self-Assembled Electroactive Ultrathin Films.- Feature and Mechanisms of Layer Growth in Liquid Phase Epitaxy of Semiconductor Materials.- Sol-Gel Deposition Processes of Thin Ceramic Films.- Thin Film Deposition By Sol-Gel And CVD Processing of Metal-Organic Precursors.- Numerical Simulation of Flow and Chemistry in Thermal Chemical Vapor Deposition Processes.- Chemical Vapor Deposition of Superconductor and Oxide Films.- Selective Chemical Vapor Deposition.- Photochemical Vapour Deposition of Thin Films.- Reaction Mechanisms in Laser-Assisted Chemical Vapor Deposition of Microstructures.- Proximal Probe Induced Chemical Processing for Nanodevice Elaboration.- Molecular Dynamics Simulation of Thin Film Growth with Energetic Atoms.- Deposition of Thin Films By Sputtering.- Mass-Transport in an Austenitic Stainless Steel Under High-Flux, Low-Energy Nitrogen Ion Bombardment at Elevated Temperature.
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