Handbook of Thin Film Deposition Techniques Principles, Methods, Equipment, and Applications
- Binding: Hardcover
- Edition: 2
- Publisher: William Andrew Pub
- Publish date: 07/01/2001
Description:
This new edition traces the technology behind the growth in the silicon semiconductor industry and the continued trend in miniaturization, covering PVD, laser and E beam assisted deposition, MBE and ion beam methods. New chapters have been added on contamination and control, chemical mechanical polishing to attain the flatness required by modern lithography methods, new materials used for interconnect dielectric materials and meterology.
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Product notice
Returnable at the third party seller's discretion and may come without consumable supplements like access codes, CD's, or workbooks.
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