Description: Chemical vapor deposition (CVD) has proven to be enormously successful as a means of producing thin films for a wide array of advanced materials applications. Abrasion-resistant coatings, epitaxial layers for semiconductor lasers and MOS transistors, and low scatter films for optical components such as mirrors and beamsplitters, all rely on the ability of CVD to deposit films of controllable composition and uniform thickness. Photochemical vapor deposition (photo-CVD) is a recent offshoot of CVD that influences the rate and products of the deposition process with light. Introducing visible, ultraviolet, or vacuum ultraviolet photons to the CVD reactor opens new possibilities for reducing film growth temperatures and for producing novel materials. The purpose of this book is to provide an overview of photochemical vapor deposition, with emphasis on the versatility of this new technique for growing metal, dielectric and semiconductor films. Applications receiving special attention include the photodeposition of dielectric films for the fabrication of VLSI devices and the growth of amorphous hydrogenated silicon for photovoltaic applications. Introductory material describing the basic principles underlying photo-CVD is the subject of the first two chapters. Chapter 3 addresses several practical aspects of designing photo-CVD systems and choosing an optical source, in particular. Following chapters discuss the current status of metal, semiconductor, and dielectric films that have been grown by photo-CVD; and the growth of other materials such as polymers and metal oxides composing the Bi-Sr-Ca-Cu-O high T(subscript c) superconductor system. Also included are a discussion of the applicationof photo-CVD to the fabrication of multilayer, short wavelength mirrors, and a review of light-enhanced surface processing such as cleaning and nitridation. The book concludes with an assessment of the future of photodeposition. Designed to be highly readable and easily adapted to the needs of a diverse audience, Photochemical Vapor Deposition will be especially valuable for the student approaching photodeposition for the first time, the thin film engineer evaluating photo-CVD for a particular application, and the experienced researcher who desires a review of the work completed to date. In addition, materials scientists and engineers or physical and analytical chemists who are applying photo-CVD to the synthesis of advanced materials will find this book to be an indispensable addition to their working libraries.

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